XPS Depth Profile of Mica Using Argon Sputtering.
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چکیده
منابع مشابه
The effect of argon and oxygen sputtering on carbon contaminant buildup on ZnO during XPS
The effect of argon and oxygen sputtering on carbon contaminant buildup on ZnO during XPS (X-ray photoelectron spectroscopy) analysis has been examined. Argon and oxygen sputtering cause a rapid decline in hydroxyl oxygen and contaminant carbon content at the surface. Reduc tion to metallic zinc is not observed. In a carefully baked instrument after sputtering a stable clean surface could be m...
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ژورنال
عنوان ژورنال: Hyomen Kagaku
سال: 1998
ISSN: 0388-5321,1881-4743
DOI: 10.1380/jsssj.19.826